Silicon Wafer Etching

Process equipment of the latest generation - of outstanding uniformity results.

Etching
Product family with modular and flexible designed equipment for etching silicon wafer.

Properties and benefits:

  • Standard etching processes (HF /HNO3, KOH, NaOH, H3PO4, BOE, DHF , SPM, SOM etc.)
  • Precise transfer times
  • Homogeneous etching over entire 300 mm wafer
  • Fully automatic process control

ARENA

RENA exibits WaSep at 26th PV SEC in Hamburg

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RENA receives TOP 100 award 2011

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CONTACT

SEMICONDUCTORS
@: Frank Schienle