Analytics & Metrology

Measuring & classification
Bath analysis
Maximum quality standards in all wet process steps are assured through permanent monitoring of process baths.

Properties and benefits:

  • Complete process monitoring
  • Process development and production support
  • Online/offline bath analysis
  • Online/offline titration


Measuring & characterisation
Devices for characterising wafer thickness, etching rates, surface roughness, damage, and other criteria can be integrated in RENA equipment for quality assurance and monitoring of material flow during wet process steps.

Properties and benefits:

  • In-line metrology
  • Surface characterisation, e.g. roughness
  • Advanced measurement tools (300 mm)
  • Thickness measurement
  • Warp and bow detection
  • Customised solutions

ARENA

RENA exibits WaSep at 26th PV SEC in Hamburg

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RENA receives TOP 100 award 2011

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CONTACT

SEMICONDUCTORS
@: Frank Schienle