Wafer cleaning & drying

Modular equipment platforms for cleaning and drying.

RCA Clean
State of the Art cleaning with pitch compressed processing and high throughput.

Properties and benefits

  • Excellent particle and metal removal
  • Pioneering control and monitoring of media and airflow
  • Safe media conditioning
  • Short bath changing timeS

 

ACD Advanced Clean Dry
Compact three-bath equipment with proven exclusive HF/03 technology.

Properties and benefits

  • Integration of several process steps within three baths: SC1, QDR, HF /O
  • Excellent particle and metal removal efficiency
  • HF /O3: metal cleaning, drying and surface conditioning in a single bath
  • High uptime

ARENA

RENA is "Innovator of the year" - TOP100 Award

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Solar technology

4rd Renewable Energy, India

August 10 - 12, 2010

 

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CONTACT

SEMICONDUCTORS
@: Frank Schienle