Wafer Drying

Drying technologies of the latest generation for high throughput.

Drying
Drying technologies for all silicon wafer cleaning requirements.

Properties and benefits:

  • Carrierless Transport
  • All drying processes from a single source according to equipment design
       Marangoni ® drying
       HF /O3 drying
       Hot water drying
       Single wafer spin rinse dryer
       Carrier spin rinse dryer
  • Short drying times
  • Residue-free drying

ARENA

RENA is "Innovator of the year" - TOP100 Award

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Solar technology

4rd Renewable Energy, India

August 10 - 12, 2010

 

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ONLINE-SERVICES

CONTACT

SEMICONDUCTORS
@: Frank Schienle