Etch with
Höllmüller EVOLUTION

Homogeneous etching for Ultra Fine Line technology.

It is not only the perfect process uniformity, but also the simple maintenance access that makes our Etch equipment unique.

Features and Benefits

  • Uniform line etching
  • Optimised fluid dynamics with high flow rates; many nozzles
  • Oscillation perpendicular to working direction
  • Staggered spray nozzle configuration
  • Nozzles aligned to spray in conveyor gap
  • Front doors with individual water sealing

ARENA

RENA exibits WaSep at 26th PV SEC in Hamburg

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RENA receives TOP 100 award 2011

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CONTACT

Circuit Board
@: Govert Beurskens