The conventional process consists of the individual steps of etching, rinsing and drying. Advanced oxide etching using only one process bath makes a contribution towards quality improvement along the whole PV process chain.

Features and Benefits

• Can also be realised by an integrated all-in-one solution using HF/O₃ drying
• Process without post-rinsing
• Minimised water consumption
• Use of ozone in liquid and gaseous form possible
• Improved adhesion of the AR layer possible