The InDop system applies a thin and homogeneous layer of phosphoric acid on the wafers before the inline diffusion process. Using soft rollers to apply the phosphoric acid, it combines a robust process and low cost of ownership with an extremely gentle wafer transport system for highest mechanical and process yields.

Features and Benefits

• Ideal line integration with RENA InTex® systems
• Doping process adapted to the texture
• Double side coating for optimised P-gettering on both sides
• Low cost of ownership by using phosphoric acid as precursor
• Formation of a thin PSG layer, easy to remove
• Excellent process homogeneity
• Stable process control
• Inline quality control by online monitoring of the deposited phosphoric acid layer
• Best emitter profiles in combination with InOxSide® EB