Best in class media consumption

The InOxSide® tool performs PSG removal and junction isolation in one single tool, thus improving the process integration and workflow in the line. The junction isolation is performed by etching the rear side of the cells while leaving the front surface dry. The patented process not only leads to superior junction isolation performance but also simplifies the production of passivated rear side cells by entirely removing the emitter from the rear side.

Features and Benefits

• PSG removal and junction isolation in one single tool
• Junction isolation performed by rear side emitter removal
- Enables processing schemes for rear-side passivated cells
• Patented process
• Process proven
• Cell efficiency increase
• Straight line footprint
• Technological leadership
- Process start up by RENA
- Best process yield