Manual wet bench

Whether it’s cleaning, etching, or stripping – wet chemical processes form the basis of the semiconductor industry, microsystem technology, and solar technology. The modular design of RENA’s WBM wet bench enables it to be flexibly adapted to process-specific requirements in laboratories and industrial production environments. Depending on the customer’s requirements, the RENA WBM wet bench can be made from PP, PPs, PVDF, ECTFE, quartz, and stainless steel.

Individual process integration

Very small-scale production or developments for research purposes require flexible production processes that can quickly be adjusted to changing conditions. We developed the manually operated RENA WBM wet bench to meet precisely these needs. Its modular design allows it to be individually adapted to innovative processes and combined with extra options such as a conductivity meter, flow box, or spin rinse dryer.

Its low floor space, easy access for maintenance, and user-friendly handling facilitate process integration. Additional process steps such as drying or centrifuging wafers can be added on without any problems. The RENA WBM wet bench is ideally suited to pre- and post-treating for electroplating processes and is compatible with the RENA EPM system. Whether it’s the semiconductor industry, microsystem technology, or solar technology, the manual RENA WBM wet bench flexibly adapts to any wet chemical processing environment.

Overview of RENA WBM benefits

  • broad choice of materials: PP, PPS, PVDF, ECTFE, stainless steel, quartz
  • modular design
  • high level of reliability
  • very low floor space
  • easy access for maintenance
  • user-friendly handling
  • suitable for 2" to 12" wafers or special wafer geometries
  • additional plating modules
Sales Director Semiconductor
Oliver Pohl
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