RENA BatchClean N designed for high-end products

High-End cleaning for High-End products

The RENA BatchClean N automated processing equipment is for batch-type cleaning processes for silicon solar cells. Depending on customer requirements, a large variety of alkaline and acidic processes are available. The equipment is based upon the RENA Batch N platform.

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Features and Benefits

Fully automated wet chemical cleaning in a Batch type process
Large variety of cleaning solutions available: RCA, acidic, alkaline, ozone based, …
Throughput up to 8000 wafer/hour depending on configuration
Integrated rinsing and drying of wafer
Long bath lifetime due to feed-and-bleed function
Tank-in-tank design for improved process homogeneity and reduced space requirement
Best-in-class dosing system for accurate and constant bath composition
Uses downholder-free carrier
Lowest breakage rate in industry
Easy maintenance
Available as BatchClean N400 (400 wafer per bath), N200 (200 wafer per bath) or N50 (50 wafer per bath)

Options

Adaption for thin wafer down to 100 µm
MES interface (SECS/GEM)
Load and Unload Extension for buffering carriers
Media cabinet for chemical supply
Waste pump station for chemical drain / waste water
Filter fan units (“Flowboxes”)
Sensors for process control (e.g. pH, conductivity)

Solarmachine Batchchlean N400 wet chemical cleaning

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Downloads

Datasheet BatchClean N600

(1 MB)

Datasheet BatchPolyClean N600

(1 MB)

Datasheet Hi-Eta Clean

(1 MB)