BatchGlass N50 - Precision Etching for Glass-Wafer Applications

The RENA BatchGlass N50 is an advanced solution engineered for processing glass wafers in alkaline media, with a focus on high-precision via formation. Specifically developed for the fabrication of blind vias and through-glass vias (TGVs), this system meets the growing demand for intricate microstructuring in glass substrates.
Ideal for RF applications, the Batch N50 enables high-quality vias production across a variety of substrate thicknesses. 
Designed for pilot-scale production, the BatchGlass N50 is a semi-automated system that combines manual wafer input with fully automated internal batch handling. The tool supports wafer sizes up to 300 mm, making it a flexible choice for R&D and small-volume manufacturing environments.

Features and benefits

  • Processing of wafers up to 300 mm
  • Optimized tank design and flow for excellent homogeneity of etching
  • Optimized footprint and compact modular design
  • 24/7 operation and easy upscaling of process
  • Highest surface cleanliness and with optimized postcleaning
  • MES and automatic compatibility
Felix Fink Technical Sales Manager
Technical Sales Manager
Felix Fink
ResponsibleResponsible for the following countries:
Worldwide