Potassium hydroxide (KOH) etching is a wet chemical process extensively used in semiconductor manufacturing to fabricate silicone micromechanical system (MEMS) microstructures. Another application for this process is texturizings the surface of solar cells. KOH is an alkaline anisotropic wet etchant which can be applied to create deep cavities, windows and vias for the fabrication of sensors, through-silicon vias (TSV) and 3D chips. For this purpose, the semiconductor sector of RENA offers SiEtch, an advanced immersion tank technology. SiEtch provides an outstanding etch rate uniformity, high etch rate and consistent performance within wafers and from batch to batch. This superiority is achieved through efficient flow dynamic in the tank as well as precise chemical concentration and temperature control. SiEtch can be integrated into our fully and semi automated semiconductor wet benches.