Final Cleaning System (FCS)

Clean wafers are the basis for excellent semiconductor products. The fully automated RENA Final Cleaning System provides highest quality surfaces for the last wafering step. Sophisticated processes and advanced scheduling make it the perfect solution for semiconductor wafer production with high throughput and challenging requirements.

Features and benefits

  • Superior surface cleanliness for wafers up to 300 mm
  • Fully automated LMC carrier handling
  • Perfect finishing with RENA Marangoni Dryer
  • Standard SEMI interfaces for easy fab integration
Head of Sales Support
Theodoros Moissidis
ResponsibleResponsible for the following countries: