RENA strives to be your partner in creating wet processing solutions. We have knowledgeable staff working on application-specific semiconductor processing solutions, including Metal Lift-Off, Etching, Cleaning, and Stripping. We are more than just Wet Benches.
Silicon nitride is a commonly used film in semiconductor manufacturing. Complete removal is necessary prior to further processing. Hot Phosphoric acid has good nitride: oxide selectivity. Maintaining a clean bath through filtering is critical for successful cleaning. Hot phosphoric nitride strip is performed at 180° C, done in a quartz bath. Temperature maintenance and etch rate are controlled by DI water spiking.
Resist Strip and Clean processes include removing photo-resist films or ashing residues after ion implantation and dry etch operations. These processes must completely remove patterned photo-resist films or ash residues while minimizing the loss of device materials.
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