Applications for wet chemical cleaning and etching processes are performed highly efficiently including rinsing and drying. RENA spray batch system is designed for acids and bases. Up to five processes can be combined in one chamber; this offers great potential for efficiency and process optimization. No direct contact to chemical by operator, this makes the process safe.
- Reduced medium consumption
- Optimized footprint
- Single or dual cassette handling
- Highly serviceable, easy access
- SECS/GEM Interface Options
- Flexible and Upgradeable
- Improved operator user safety