Acid Etching System - AES
The RENA AES wet etching tool is built to achieve outstanding results in wafer production. Acidic etching combined with a fast transport system enables precise process control. For wafers up to 300 mm this fully automated tool fulfills all requirements for high-end wafer production and is completely complient to all SEMI-standards. On top the carrier-less half-pitch processing capabilities guarantee highest throughput rates.