RENA COMPASS Spin Rinse Dryers are premium wafer dryers that rinse off any residues left over from previous process steps and then dry the wafer. The proprietary design and technology along with the use of CDA for non-process functions reduces the idle time of Nitrogen use by 50%. The RENA COMPASS SRD family is designed to reduce operating cost while exceeding cleanliness, dryness and particle specifications and offers the most advanced features found in today’s SRD. The entire process is monitored and controlled by RENA’s exclusive IDX Process Control software.