Best-in-class production equipment

The RENA BatchTex® N manufacturing equipment is the number one solution for high throughput and best quality alkaline texturing process for monocrystalline silicon (mono-Si). The RENA monoTEX® process technology ensures a top-grade texturing result and is the RENA BatchTex® is most used solution in the industry. The equipment is based on the RENA Batch N platform.

Features and Benefits

  • Fully automated saw damage removal and alkaline texturing for mono-Si in a Batch type process
  • RENA monoTEX® texturing process for highest quality and productivity
  • Throughput up to 14,000 wafer/hour depending on configuration
  • Integrated cleaning, rinsing and drying of wafer
  • Long bath lifetime due to feed-and-bleed function
  • Tank-in-tank design for improved process homogeneity and reduced space requirement
  • Best-in-class dosing system for accurate and constant bath composition
  • Uses downholder-free carrier
  • Lowest breakage rate in industry
  • Easy maintenance
  • Available as BatchTex® N600 (600 wafer per bath, N400 (400 wafer per bath), or N50 (50 wafer per bath)


  • Adaption for thin wafer down to 100 µm
  • Adapted version for silicon heterojunction (SHJ) available
  • Weighing scale: automated etch loss measurement
  • MES interface (SECS/GEM)
  • Load and Unload Extension for buffering carriers
  • Media cabinet for chemical supply
  • Waste pump station for chemical drain / waste water
  • Filter fan units (“Flowboxes”)
  • Sensors for process control (e.g. pH, conductivity)
Solar Batch Bath Blue solarcell
BatchTex® N for Silicon Heterojunction Applications

BatchTex® N600

BatchTex® N400

BatchTex® N400 XL

Andreas Eigeldinger