Innovation in Focus: RENA Technologies at Wet User Meeting

On November 27–28, 2025, RENA Technologies proudly participated as a Silver Sponsor at the European CMP & WET Users Group Fall Meeting in Asnières-sur-Oise, where we unveiled a industry-first innovation:
 

The world’s first wet chemical processing solution for etching silicon carbide (SiC).

During the two-day event, RENA Technologies actively contributed to high-level expert discussions on stress release and defect removal in compound semiconductors using wet chemical etching. Our participation once again highlighted RENA’s role as a leading technology partner in wet processing for semiconductors and compound materials.

Trade fair highlight at the booth: Wet bench Revolution+

Our latest platform solution impressed visitors with state-of-the-art technology:

• Etching, cleaning, stripping, and drying – all in a compact footprint

• Optional Genesis Marangoni Dryer for defect-free drying

• Patented tank technology for metal etching and metal lift-off

Numerous visitors took the opportunity to learn more about our future-proof wet processing solutions for semiconductors, glass, and compound materials. With highly customizable systems and a global service network of expert technicians, RENA Technologies once again demonstrated:

We are your partner for advanced wet chemical processing.

We thank all customers, partners, and industry peers for the inspiring exchange and look forward to future events!

⇒ Click here to get to our wet chemical solutions

⇒ Are you interested in our wet chemical systems? Please contact our sales team.