Silicon Carbide (SiC) is not just a material. It’s a headliner.

Powerful. Unpredictable. And known for refusing to be forced into existing processes.

In power electronics, SiC sets the tempo - but anyone trying to process it with conventional wet methods quickly realizes: this wave doesn’t play by old rules.
Too steep. Too fast. Too uncompromising. Many get stuck right here - somewhere between potential and reality.

RENA Technologies puts you back in the line-up.

With ACE (Advanced Chemical Etching), we’ve developed the first wet etching solution that doesn’t hold SiC back, it lets it perform.
No half measures. No fighting the material. Just control on a whole new level.

ACE is your perfect board for the most demanding wave in semiconductor manufacturing:
• True chemical etching of SiC: precise like a perfectly played solo
• Reduced wafer stress: so nothing “breaks” when it matters most
• Removal of crystalline defects: for maximum yield and stable performance
• Compact & fully automated: seamlessly integrates into your line without wasting space

While others are still trying to control the energy of SiC, you harness it.

You’re no longer standing at the edge.
You’re right in it, on the wave, in the moment, in the flow.
No hesitation. No turning back. Just performance.

Ready to bring your SiC production to the main stage?
ACE, when you don’t just ride the wave, but dominate the show.

» Explore the RENA Technologies ACE tool in more detail

» If you would like to get in touch with our sales team, we look forward to hearing from you