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May 01, 2021

Performance additive RENA monoTEX 3.x series

Reach the top cell performance by RENA monoTEX 3.x series texture additive!
With our patented (DE 10 2008 014 166B3) process sequence we combine narrowest pyramid distribution with lowest reflection by peak tailoring. 

  • Pyramid size of < 2.5µm, +/- 0.5µm with reflection <10% (weighted)
  • Low chemistry consumption in PERC texture w/o saw damage removal step
  • Equal reflection level with full saw damage removal on passivated cells concepts
  • Perfect performance on SHJ, TOPCon and PERC technologies by one additive

More information at:

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Phone : +49 7723 9313-0