RENA Convergence – Advanced Wet Processing Platform for High-End Wafer Applications

Convergence is RENA’s high-performance platform for demanding wet chemical processes in semiconductor manufacturing. Engineered for precision and efficiency, it meets the complex requirements of modern 200 mm and 300 mm wafer fabs.

The Convergence wafer processing platform offers:

• Highly optimized throughput and process uniformity, enabled by flow- and geometry-optimized modules
• Modular system architecture – scalable for various production capacities and flexibly adaptable to process requirements
• Full SECS/GEM compliance for seamless integration into fab automation environments
• RENA Smart Software with integrated process control, safety layers, and state-of-the-art user interface technology
• Service-oriented design for minimal downtime and maximum equipment availability

The Convergence wet bench combines advanced process architecture with customizable functionality – ideal for etching, cleaning, resist stripping, and drying in both front-end and back-end semiconductor manufacturing.

From sapphire to silicon carbide to standard silicon, the Convergence platform reliably and consistently processes a wide range of substrate materials – delivering high process quality across all wafer thicknesses.

With the Convergence wafer processing platform, you invest in a future-proof solution that integrates into your existing production lines and helps you master technological complexity.

Ready to take your semiconductor manufacturing to the next level?
Connect with our team of experts or learn more about RENA Convergence online.

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