This cube changes everything.

Precise, automated wafer cleaning for next-generation semiconductors – high-end wet processing for the most demanding applications in SiC, GaN, and InP.

Next-generation semiconductors are built on advanced compound materials such as Silicon Carbide (SiC), Gallium Nitride (GaN), and Indium Phosphide (InP). In these high-performance applications, precise wet processes and controlled wafer cleaning are critical: even the smallest contamination can significantly impact performance, reliability, and yield.

Consistent and reproducible results in wet chemical processes such as wet etching, cleaning, stripping, and drying require advanced wet chemical equipment (wet bench systems) and maximum process control in semiconductor manufacturing.

The RENA Revolution+ is a compact, fully automated wet chemical system (automatic wet bench) designed for batch immersion wafer processing. Equipped with multiple process tanks, it enables precise and efficient wet processing within a minimal footprint.

Ideal for R&D, pilot lines, and advanced semiconductor manufacturing in photonics, RF components, and power electronics, the RENA Revolution+ delivers maximum flexibility, process stability, and repeatability

» Explore the Revolution+ wet bench in more detail

» If you would like to get in touch with our sales team, we look forward to hearing from you